Core Advantages:
Nanoscale Uniformity and Sharpness :
Precise particle size distribution and high concentration ensure highly consistent diamond micro-blade dimensions, providing critical support for ultra-narrow kerf cutting and low chipping control.
Excellent Dispersion Stability:
Low agglomeration rate of fine particles and high proportion of single-particle dispersion reduce risks of chipping, wafer micro-cracks, and abnormal tool wear caused by particle clustering.
Wafer-Level High Purity:
Utilizing Tiakan’s proprietary deep purification process, the product achieves high purity with no magnetic substances, eliminating surface contamination and device failure risks during cutting,
thereby enhancing chip reliability.
Oriented Micro-Blade Reinforcement:
A high proportion of regular isometric shapes and high-integrity crystals, combined with special surface treatment, optimizes micro-blade strength and self-sharpening, improving cutting efficiency and
extending tool life.
Stringent Quality Control:
A rigorous full-process quality control system ensures consistent parameters such as particle size, crystal form, and strength across batches, providing key guarantees for long-term cutting process stability and
yield improvement.
Available Particle Size Specifications:
Applicable Cutting Stages and Recommended Particle Sizes:
Specialized Micropowder for Dicing Blades |
Precision Cutting | Semi-finish Cutting | Rough Cutting/Grooving |
0.5μm ~ 2μm | 2μm ~ 5μm | 5μm ~ 15μm |
TianJian Dicing Blade Specialized Diamond Micropowder provides critical support for high-precision cutting and yield improvement in the processing of third-generation semiconductor materials (SiC/GaN),
advanced packaging ultra-thin wafers, and high-density IC chips, contributing to the development of domestic high-end dicing technology.
Application Scenarios:
Wafer Dicing Blade
IC Chip Dicing
Electronic Ceramic Substrate Dicing
High-performance Composite Material Package Dicing



